1:Having nearly 24years of work experience in large enterprises, possessing sufficient experience in team work allocation management, incentive system, daily work system, skill training, etc;
2:From a technical perspective, I have rich experience in the installation, maintenance, repair, and fine tuning of semiconductor equipment. The main proficient devices are;
a)Thin film tools:AMAT Endura5500-PVD/P5K-CVD,Nexx Nimbus-PVD,Mattson Aspen-CVD.
b) Etch tools: AMAT DPS-CENTURA/Avatar/C3, TEL UNITY/SCCM JIN/VIGUS RK3/ RK4/RK5/RK6, LAM Corunus HP/KIYO EX/FX/FXE, AMEC HDRIE, Mattson Suprema XP, PSK Ecolite2000-Descum/SUPRA N, Able to solve common abnormalities in the operation of semiconductor equipment and maintain the normal operation of the production line;
3:from process perspective:
a) I am very familiar with the R&D and mass production processes and processes of 39L/73L/128L/192L/256L 3D NAND NPI, mainly involving process steps such as CT etch, strip, and level. I am familiar with process tuning, yield improvement, defect reduction, process CIP optimization, and daily inline CD monitoring.
b) For the DRAM industry, I am mainly familiar with the research and development of products below 21nm/18nm/14nm, with a focus on tuning M0 LP loop and PC loop.
Project Achievement:
1、 M0 line bridge and broken issue resolution
2、 M0 HM LWR improvement
3、 PC CDU improvement and CD shrink issue resolved
4、 PC sidewall protection and small CD improvement
Project Achievement:
1. Contact Sidewall Damage Improvement
2. 39L 3D NAND ETCH module CT development,the production has passed WAT and CP test and start to transfer to new production line
3. 39L CT bowing free CIP improvement
4. 73L 3D NAND CT process development,including SSCT和Peri CT,the process tuning target is to meet CD criteria and profile,and also pass WAT test
5. Resolve the CT OX surface pitting issue
6. CT strip process new recipe development with H2O2 instead of H2N2.
Project Achievement:
1. BKM of Nexx PVD Improvement on Deposition Chamber L-shape Side Shield
2. Wafer surface NiV film peeling defect improvement.
3. Improve the parts clean method so as to extend process kit life time.
Project Achievement:
1. PM pass rate above 90%.
2. Tool parts clean method improvement and as cost requirement ,change to clean parts by self instead of vendor.
3. Better product throughput in whole company.
4. Winner of labor skill competition in 2001-2002